Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates
Ar + H2 plasma etching for improved adhesion of PVD coatings on steel substrates
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DOI：
10.1016/j.vacuum.2011.10.028
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发表时间：
2012-02-29
期刊：
影响因子：
4
通讯作者：
Srinivas, G.
中科院分区：
文献类型：
--
作者：
Barshilia, Harish C.;Ananth, A.;Srinivas, G.
Ar + H-2等离子体清洗用于钢基体的表面改性，可以有效地去除基体表面的氧化物和其他污染物，从而使物理气相沉积（PVD）涂层具有更好的附着力。在等离子体处理（Ar和Ar + H-2）和未处理的低碳钢（MS）基体上沉积了大约1.1-1.3 μ m厚的TiAlN涂层。根据x射线光电子能谱（XPS）、场发射扫描电镜（FESEM）和原子力显微镜（AFM）的数据，提出了等离子体处理对衬底表面影响的机理。对未处理和Ar + H-2等离子体刻蚀的MS衬底的XPS测量表明，未处理的衬底表面主要由Fe3O4组成，而刻蚀后氧化物浓度明显下降。FESEM和AFM结果表明，Ar + H-2等离子体刻蚀导致表面形貌发生变化，基底粗糙度增加。由于Ar + H-2等离子体蚀刻，去除氧化物/污染物，形成更粗糙的表面，增加了衬底表面的粗糙度，促进了衬底表面良好的机械联锁，从而使沉积的PVD涂层具有更好的附着力。通过加入极薄的Ti中间层，可以进一步提高TiAlN涂层的附着力。(C) 2011 Elsevier Ltd.版权所有。
Ar + H-2 plasma cleaning has been described for the surface modification of the steel substrates, which removes oxides and other contaminants from substrate surface effectively leading to a better adhesion of the physical vapor deposited (PVD) coatings. Approximately 1.1-1.3 mu m thick TiAlN coatings were deposited on plasma treated (Ar and Ar + H-2) and untreated mild steel (MS) substrates. A mechanism has been put forward to explain the effect of plasma treatment on the substrate surface based upon the data obtained from X-ray photoelectron spectroscopy (XPS), field-emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). The XPS measurements on untreated and Ar + H-2 plasma etched MS substrates indicated that the untreated substrate surface mainly consisted of Fe3O4, whereas, after etching the concentration of oxides decreased considerably. The FESEM and the AFM results showed changes in the surface morphology and an increase in the substrate roughness as a result of Ar + H-2 plasma etching. Removal of oxide/contaminants, formation of coarser surface and increased substrate surface roughness as a result of Ar + H-2 plasma etching facilitate good mechanical interlocking at the substrate surface, leading to a better adhesion of the deposited PVD coatings. The adhesion of TiAlN coating could be increased further by incorporating a very thin Ti interlayer. (C) 2011 Elsevier Ltd. All rights reserved.