High refractive index and high transparency HfO2 nanocomposites for next generation lithography
High refractive index and high transparency HfO2 nanocomposites for next generation lithography
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DOI：
10.1039/c0jm00679c
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发表时间：
2010-01-01
影响因子：
--
通讯作者：
Ober, Christopher K.
中科院分区：
文献类型：
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作者：
Bae, Woo Jin;Trikeriotis, Markos;Ober, Christopher K.
经选择的配体稳定的HfO2纳米粒子在193 nm辐射下具有高折射率和低吸光度。这些材料与适当的光致聚合物结合用作纳米复合光致抗蚀剂。所得到的纳米复合材料被成功地用于高分辨率图案化。
HfO2 nanoparticles stabilized with selected ligands possess high refractive index and low absorbance under 193 nm radiation. These materials combined with an appropriate photopolymer were used as a nanocomposite photoresist. The resulting nanocomposite materials were used successfully for high resolution patterning.