Improved luminescence intensity and stability of nanocrystalline silicon due to the passivation of nonluminescent states
Improved luminescence intensity and stability of nanocrystalline silicon due to the passivation of nonluminescent states
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DOI:
10.1063/1.1913796
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发表时间:
2005-05-15
影响因子:
3.2
通讯作者:
Hirakuri, K
中科院分区:
文献类型:
--
作者:
Sato, K;Hirakuri, K
Luminescence intensity and stability of nanocrystalline silicon (nc-Si) passivated with oxygen and hydrogen atoms have been studied by using electron-spin resonance and photoluminescence measurements. The oxygen-passivated nc-Si with low-density P-ce' centers (luminescent states) and high-density P-b centers (nonluminescent states) exhibited weak red luminescence. When the nc-Si surface was passivated with hydrogen atoms in addition to oxygen atoms using a hydrofluoric acid solution treatment, the intensity of red luminescence increased more than one order of magnitude with an increase of P-ce' centers and reduction of P-b centers on the surface. Furthermore, the red luminescence of nc-Si was very stable even after aging beyond one year, owing to the existence of only P-ce' centers and the absence of P-b centers. These results are a strong indication that the improved luminescence intensity and stability is due to the hydrogen and oxygen passivation of nonluminescent states. (c) 2005 American Institute of Physics.