TiO2 thin film coating on a capillary inner surface using atmospheric-pressure microplasma
TiO2 thin film coating on a capillary inner surface using atmospheric-pressure microplasma
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DOI：
10.1016/j.surfcoat.2008.06.065
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发表时间：
2008-08
影响因子：
5.4
通讯作者：
H. Yoshiki;T. Mitsui
中科院分区：
文献类型：
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作者：
H. Yoshiki;T. Mitsui
采用等离子体增强化学气相沉积（PE-CVD）技术，以四异丙醇钛和氧气为反应物，氦气为载气，在大气压下，在玻璃芯片毛细管内表面制备二氧化钛（TiO2）薄膜。使用外部连接的平行板电极，通过 13.56 MHz 的射频激励，在毛细管内产生横截面为 1×1 mm2、长度为 15 mm 的微等离子体。沉积 60 分钟后，透明薄膜沉积在毛细管内表面上。 X射线光电子能谱表明沉积的薄膜处于TiO2的化学结合状态。扫描电子显微镜图像显示TiO2薄膜表面有些粗糙，含有微米/纳米颗粒。典型的薄膜厚度约为 200 nm。还通过三维表面结构分析仪测量了膜厚度的空间分布。
Titanium dioxide (TiO2) thin films were prepared on a capillary inner surface on a glass chip using plasma-enhanced chemical vapor deposition (PE-CVD) with titanium tetraisopropoxide and oxygen as reactants and helium as the carrier gas at atmospheric pressure. A microplasma was generated inside the capillary with a cross section of 1×1 mm2and a length of 15 mm by radio frequency excitation of 13.56 MHz using externally attached parallel-plate electrodes. After 60 min deposition, transparent thin films were deposited on a capillary inner surface. X-ray photoelectron spectroscopy revealed that the deposited films are in the chemical binding state of TiO2. Scanning electron microscopy images showed that TiO2thin films have somewhat rough surface with micro/nanoparticles. Typical film thickness was approximately 200 nm. Spatial distribution of the film thickness was also measured by 3 dimensional surface structure analyzer.