Comparison of the temperature dependence of the mechanical dissipation in thin films of Ta2O5 and Ta2O5 doped with TiO2
Comparison of the temperature dependence of the mechanical dissipation in thin films of Ta2O5 and Ta2O5 doped with TiO2
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DOI：
10.1088/0264-9381/26/15/155012
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发表时间：
2009-08
影响因子：
3.5
通讯作者：
I. Martin;E. Chalkley;R. Nawrodt;H. Armandula;R. Bassiri;C. Comtet;M. Fejer;A. Gretarsson;G. Harry;D. Heinert;J. Hough;I. MacLaren;C. Michel;J. Montorio;N. Morgado;S. Penn;S. Reid;R. Route;S. Rowan;C. Schwarz;P. Seidel;W. Vodel;A. Woodcraft
中科院分区：
文献类型：
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作者：
I. Martin;E. Chalkley;R. Nawrodt;H. Armandula;R. Bassiri;C. Comtet;M. Fejer;A. Gretarsson;G. Harry;D. Heinert;J. Hough;I. MacLaren;C. Michel;J. Montorio;N. Morgado;S. Penn;S. Reid;R. Route;S. Rowan;C. Schwarz;P. Seidel;W. Vodel;A. Woodcraft
在这里，我们报告的第一个结果比较Ta2O5和Ta2O5掺杂TiO 2的薄膜中的机械耗散的温度依赖性，适用于先进的引力波探测器的多层光学涂层的类型。结果表明，Ta2O5掺杂TiO2可以显著改变低温耗散峰的激活能分布。
Here we report the first results comparing the temperature dependence of the mechanical dissipation in thin films of Ta2O5 and Ta2O5 doped with TiO2, of a type suitable for use in the multilayer optical coatings for advanced gravitational wave detectors. The results indicate that doping Ta2O5 with TiO2 can significantly alter the distribution of activation energies associated with the low-temperature dissipation peak.