Y.Setsuhara: "PHOTON-INDUCED PHONON EXCITATION PROCESS AS NONEQUILLIBRIUM SUBSURACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION"4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003),
Y.Setsuhara: "PHOTON-INDUCED PHONON EXCITATION PROCESS AS NONEQUILLIBRIUM SUBSURACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION"4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003),
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Y.Setsuhara：“光子诱导声子激发过程作为离子注入纳米级层的非平衡子表面改性用于超浅结形成”第四届亚欧等离子体表面工程国际会议（AEPSE 2003），
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