Maize glossy6 is involved in cuticular wax deposition and drought tolerance
Maize glossy6 is involved in cuticular wax deposition and drought tolerance
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玉米光泽6参与角质层蜡质沉积和耐旱性
DOI：
10.1093/jxb/erz131
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发表时间：
2019-06-01
影响因子：
6.9
通讯作者：
Zheng, Jun
中科院分区：
文献类型：
--
作者：
Li, Li;Du, Yicong;Zheng, Jun
表皮蜡，长链烃化合物，形成大多数陆生植物植物表面的最外层。表皮蜡的存在保护植物免受水分流失和其他环境胁迫。克隆和表征参与表皮蜡的调节、生物合成和细胞外运输到表皮细胞表面的基因揭示了表皮蜡积累的分子基础。然而，合成蜡的细胞内运输到质膜用于细胞分泌的知之甚少。在这里，我们的特点是玉米光泽（gl 6）突变体，表现出减少上表皮蜡质负荷，增加角质层渗透性，降低幼苗耐旱性相对于野生型。我们结合基于RNA测序的作图方法（BSR-Seq）和染色体步移来鉴定gl 6候选基因，这通过多个独立突变等位基因的分析来证实。gl 6基因代表了一种新的玉米光泽基因，含有一个保守的，但未表征的DUF 538结构域。这项研究表明，GL 6蛋白可能参与角质层蜡的细胞内运输，打开大门，阐明知之甚少的过程，角质层蜡从其生物合成位点运输到质膜。
Cuticular waxes, long-chain hydrocarbon compounds, form the outermost layer of plant surfaces in most terrestrial plants. The presence of cuticular waxes protects plants from water loss and other environmental stresses. Cloning and characterization of genes involved in the regulation, biosynthesis, and extracellular transport of cuticular waxes onto the surface of epidermal cells have revealed the molecular basis of cuticular wax accumulation. However, intracellular trafficking of synthesized waxes to the plasma membrane for cellular secretion is poorly understood. Here, we characterized a maize glossy (gl6) mutant that exhibited decreased epicuticular wax load, increased cuticle permeability, and reduced seedling drought tolerance relative to wild-type. We combined an RNA-sequencing-based mapping approach (BSR-Seq) and chromosome walking to identify the gl6 candidate gene, which was confirmed via the analysis of multiple independent mutant alleles. The gl6 gene represents a novel maize glossy gene containing a conserved, but uncharacterized, DUF538 domain. This study suggests that the GL6 protein may be involved in the intracellular trafficking of cuticular waxes, opening the door to elucidating the poorly understood process by which cuticular wax is transported from its site of biosynthesis to the plasma membrane.