UV 222 nm Emission from KrCl* Excimer Lamps Greatly Improves Advanced Oxidation Performance in Water Treatment
UV 222 nm Emission from KrCl* Excimer Lamps Greatly Improves Advanced Oxidation Performance in Water Treatment
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DOI：
10.1021/acs.estlett.2c00472
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发表时间：
2022-08
期刊：
影响因子：
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通讯作者：
Emma M. Payne;Bryan Liu;Lauren Mullen;K. Linden
中科院分区：
文献类型：
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作者：
Emma M. Payne;Bryan Liu;Lauren Mullen;K. Linden
KRCL*准分子灯在222 nm处发射，具有提高基于紫外线(UV)的高级氧化效率的潜力。实验在超纯水和地下水中进行，对比了低压紫外灯(LPUV)和KRCL*准分子灯，以及两种不同的自由基促进剂[过氧化氢(H2O2)和硝酸盐(NO3-)]。与传统的LPUV/H_2O_2相比，在超纯水中，KRCL*/NO_3-UV/AOP的稳态羟基自由基(·OH)浓度是常规LPUV/H_2O_2工艺的13.1倍，而KRCL*/H_2O_2工艺的稳态羟基自由基浓度是常规LPUV/H_2O_2工艺的9.4倍；地下水中的羟基自由基浓度分别是常规LPUV/H_2O_2工艺的7.3倍和3.7倍，均采用标准的单探针化合物衰减法。这项工作确定了几个必须解决的研究空白，以促进在UV/AOP中采用KRCL*，包括开发使用不同UV辐射源和自由基促进剂的UV/AOPS的比较方法，需要获取有关所关注污染物在222 nm处的直接光解量子产率的更多信息，以及背景水基质成分对自由基促进或任何副产物形成的影响，特别是在NO3-作为自由基促进剂的情况下。
KrCl* excimer lamps emitting at 222 nm hold potential for enhancing ultraviolet (UV)-based advanced oxidation efficiency. Experiments were conducted in both ultrapure water and groundwater comparing low-pressure UV (LPUV) and KrCl* excimer lamps, with two different radical promoters [hydrogen peroxide (H2O2) and nitrate (NO3–)]. Compared to that of conventional LPUV/H2O2, the steady-state hydroxyl radical (•OH) concentration achieved in the KrCl*/NO3–UV/AOP was 13.1 times greater while that for the KrCl*/H2O2process was 9.4 times greater in ultrapure water; the values in groundwater were 7.3 and 3.7 times greater, respectively, all using a standard single probe compound decay method as a proxy for •OH radical generation. This work identified several research gaps that must be addressed to facilitate adoption of KrCl* for UV/AOP, including development of methods for comparing UV/AOPs that utilize different UV radiation sources and radical promoters, a need to acquire more information about direct photolysis quantum yields at 222 nm for contaminants of concern, and the impact of the background water matrix constituents on radical promotion or formation of any byproducts, especially in the presence of NO3–as a radical promoter.