High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
复制标题
脉冲直流磁控溅射高速沉积硫化镉薄膜
DOI：
10.1016/j.tsf.2014.11.065
复制
发表时间：
2015
期刊：
影响因子：
2.1
通讯作者：
J. Walls
中科院分区：
文献类型：
--
作者：
F. Lisco;P. Kamiński;A. Abbas;J. Bowers;G. Claudio;M. Losurdo;J. Walls
F. Lisco a，P. Kaminski a，A. Abbas a，JW Bowers a，G.克劳迪奥，M。Losurdo B，JM Walls a a可再生能源系统技术中心（CREST），电子，电气和系统工程学院，拉夫堡大学，莱斯特郡LE 11 3 TU，英国B无机方法和等离子体研究所，IMIP-CNR，via Orabona 4，70126巴里，意大利摘要articleinfo
F. Lisco a,⁎, PM Kaminski a, A. Abbas a, JW Bowers a, G. Claudio a, M. Losurdo b, JM Walls a a Centre for Renewable Energy Systems Technology (CREST), School of Electronic, Electrical and Systems Engineering, Loughborough University, Leicestershire LE11 3TU, UK b Institute of Inorganic Methodologies and of Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari, Italy abstract articleinfo