Nanostructure array fabrication with a size-controllable natural lithography
Nanostructure array fabrication with a size-controllable natural lithography
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DOI：
10.1063/1.120220
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发表时间：
1997-11-17
影响因子：
4
通讯作者：
Koike, K
中科院分区：
文献类型：
--
作者：
Haginoya, C;Ishibashi, M;Koike, K
开发了一种简单的尺寸可控的纳米结构阵列形成技术，使用自组装的聚苯乙烯微珠，其直径可以通过反应离子刻蚀来任意减小。我们已经在硅衬底上制作了直径为83 nm和157 nm、间距为200 nm的孔阵列，该技术在许多科学和技术领域都有潜在的应用前景。(C)1997年美国物理研究所。
A simple technique for size-controllable nanostructure array formation has been developed, using self-assembled polystyrene beads whose diameters can be arbitrarily reduced by reactive ion etching. We have produced a hole array of 83 and 157 nm diameter with 200 nm pitch on Si substrate, This technique can find potential applications in many areas of science and technology. (C) 1997 American Institute of Physics.