Low-Cycle Fatigue Properties of Ti6Al4V Laser-Welded Joints Based on a Local Strain Approach
Low-Cycle Fatigue Properties of Ti6Al4V Laser-Welded Joints Based on a Local Strain Approach
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基于局部应变方法的 Ti6Al4V 激光焊接接头的低周疲劳性能
DOI：
10.1007/s11665-021-05540-7
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发表时间：
2021-02
影响因子：
2.3
通讯作者：
Sun Pinpin
中科院分区：
文献类型：
--
作者：
Xu Zhenzhen;Zhang Jianxun;Wang Wenke;Sun Pinpin
使用光滑和带缺口的平板试样研究了Ti6Al4V以及不同焊接速度的激光焊接接头的低周疲劳（LCF）性能。提出了一种局部应变方法来评估带缺口平板试样的低周疲劳性能。
The low-cycle fatigue (LCF) properties of Ti6Al4V and laser-welded joints with different welding speeds are studied using smooth and notched flat specimens. A local strain approach is proposed to estimate the LCF properties of the notched flat specimen based on elastic–plastic finite element analysis (EPFEA). The local strain used in the approach is defined as the average strain in the plastic zone at the notch root and critical section of the notched flat specimen. The results indicate that the local strain approach is suitable for estimating the LCF properties of the notched flat Ti6Al4V titanium alloy specimen. The stress–strain relationship derived from the microhardness can be used in the EPFEA. The LCF properties of the Ti6Al4V laser-welded joints are worse in the heat-affected zone (HAZ) than in the base metal (BM) due to the martensite structure in the HAZ and the mechanical heterogeneity in the welded joints. The LCF properties of the Ti6Al4V laser-welded joints with different welding speeds are close under low strain levels and worse with higher welding speeds under high strain levels.
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影响因子：
6
作者：
K. Tateishi;T. Hanji
通讯作者：
K. Tateishi;T. Hanji
DOI：
10.3390/met7060221
发表时间：
2017-06
期刊：
--
影响因子：
--
作者：
C. Köse;E. Karaca
通讯作者：
C. Köse;E. Karaca
影响因子：
6
作者：
R. Sandhya;A. Veeramani;K. B. S. Rao;S. Mannan
通讯作者：
R. Sandhya;A. Veeramani;K. B. S. Rao;S. Mannan
影响因子：
2.3
作者：
W. Lu;Yaowu Shi;Xiaoyan Li;Y. Lei
通讯作者：
W. Lu;Yaowu Shi;Xiaoyan Li;Y. Lei
影响因子：
6
作者：
Yasuko Besel;M. Besel;E. Dietrich;J. Wischek;Ulises Alfaro Mercado;T. Kakiuchi;Y. Uematsu
通讯作者：
Yasuko Besel;M. Besel;E. Dietrich;J. Wischek;Ulises Alfaro Mercado;T. Kakiuchi;Y. Uematsu