Adhesion assessment of silicon carbide, carbon, and carbon nitride ultrathin overcoats by nanoscratch techniques
Adhesion assessment of silicon carbide, carbon, and carbon nitride ultrathin overcoats by nanoscratch techniques
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DOI：
10.1063/1.364551
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发表时间：
1997-04
影响因子：
3.2
通讯作者：
H. Deng;T. Scharf;J. Barnard
中科院分区：
文献类型：
--
作者：
H. Deng;T. Scharf;J. Barnard
本文给出了用溅射方法在硅(111)衬底上沉积20 nm超薄碳化硅、非晶碳和氮化碳薄膜的实验结果。在实验中，超薄的大衣被面朝前的Berkovich钻石压痕划伤，该压痕带有连续的深度传感纳米划痕系统。实验结果表明，该系统对检测超薄涂层开裂、剥落和划痕引起的脆性断裂具有很好的灵敏度。通过纳米划痕技术确定了每个膜的明确的临界载荷。CN薄膜的临界载荷最高(800μN)，而碳化硅薄膜的临界载荷最低(500μN)。扫描电子显微镜(SEM)对样品表面损伤的研究表明，由于其脆性断裂，碳化硅涂层的损伤比其他薄膜严重。三种薄膜在氮化碳中的附着力最好，无定形碳膜次之，无定形碳膜次之，氮化碳膜最小。
This paper presents experimental results for adhesion assessment of 20 nm ultrathin SiC, amorphous carbon and carbon nitride films deposited on silicon (111) substrates by sputtering. In the experiment, the ultrathin overcoats were scratched by a face-forward Berkovich diamond indenter with a continuous depth sensing nanoscratch system. Experimental results indicate that the nanoscratch system has very good sensitivity for detecting ultrathin overcoat cracking, delamination, and brittle fracture caused by scratching. A well-defined critical load for each film was determined by the nanoscratch techniques. The highest critical load (800 μN) is found for the CN film and the lowest (500 μN) is for SiC. Scanning electron microscopy (SEM) investigations to the surface damage of the samples reveal that the SiC overcoat was damaged more severely than other films due to its brittle fracture. The adhesion properties of the three films tested in this work are best in carbon nitride, followed by amorphous carbon and ...