Multi-Purpose Pattern-Fitting System RIETAN-2000 and its Applications to Microporous Materials
Multi-Purpose Pattern-Fitting System RIETAN-2000 and its Applications to Microporous Materials
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多功能模型拟合系统RIETAN-2000及其在微孔材料中的应用
DOI:
10.5940/jcrsj.42.516
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发表时间:
2000
期刊:
影响因子:
--
通讯作者:
T. Ikeda
中科院分区:
文献类型:
--
作者:
F. Izumi;T. Ikeda
A heavy-duty system of high performance, RIETAN-2000, has recently been developed for Rietveld refinement, Le Bail refinement, whole-pattern fitting based on a maximum-entropy method (MEM), and individual profile fitting. An original feature called partial profile relaxation is applicable to (nearly) isolated reflections with relatively large residuals, which leads to better fits in these reflections. The state-of-the-art technology of MEM-based wholepattern fitting allows us to represent positional disorder, chemical bonds, and anharmonic thermal motion more adequately than the conventional Rietveld method. Four examples of applying RIETAN-2000 to microporous materials are introduced to demonstrate its high ability to analyze structural details.