Fabrication of noble‐metal nanoconstrictions and observation of conductance fluctuations

Fabrication of noble‐metal nanoconstrictions and observation of conductance fluctuations
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贵金属纳米收缩的制备和电导波动的观察

DOI:
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发表时间:
1994
期刊:
影响因子:
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通讯作者:
H. Hein
H. Hein
中科院分区:
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文献类型:
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作者:
E. Scheer;H. Löhneysen;H. Hein

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我们描述了平面金属纳米结构的制造,其横向尺寸低至约80纳米,厚度从15到50纳米不等。我们在硅衬底上使用聚甲基丙烯酸甲酯双层抗蚀剂和电子束写入系统进行微加工。贵金属层是通过热蒸发沉积的。几何形状是点接触,环,和导线在两引线配置。我们讨论了在极低温度和高达4 T的磁场中根据样品宽度的磁导率的测量。在这里,电子输运处于扩散状态,并研究了通用电导波动的宽度依赖性。
We describe the fabrication of planar metallic nanostructures with lateral dimensions down to about 80 nm and thicknesses varying from 15 to 50 nm. We use a lift‐off process with a polymethylmethacerylate bilayer resist on silicon substrate and an electron beam writer system for microfabrication. The noble‐metal layers are deposited by thermal evaporation. The geometries are point contacts, rings, and wires in two‐lead configuration. We discuss measurements of the magnetoconductance at very low temperatures and in magnetic fields up to 4 T in dependence of the width of the samples. Here the electron transport is in the diffusive regime and the width dependence of the universal conductance fluctuations is investigated.