Bubble-Pen Lithography.
Bubble-Pen Lithography.
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DOI：
10.1021/acs.nanolett.5b04524
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发表时间：
2016-01-13
期刊：
影响因子：
10.8
通讯作者：
Zheng Y
中科院分区：
文献类型：
--
作者：
Lin L;Peng X;Mao Z;Li W;Yogeesh MN;Rajeeva BB;Perillo EP;Dunn AK;Akinwande D;Zheng Y
当前的光刻技术利用光子、电子或离子束来诱导化学或物理反应以进行微/纳米制造，但在对化学合成的胶体粒子进行图案化方面一直具有挑战性，而这些胶体粒子正逐渐成为功能器件的构建模块。在此，我们开发了一种新技术——气泡笔光刻（BPL），利用光学控制的微气泡在基底上对胶体粒子进行图案化。简而言之，单束激光通过等离子体增强的光热效应在胶体悬浮液和等离子体基底的界面处产生一个微气泡。微气泡通过马兰戈尼对流、表面张力、气压和基底附着力的协同作用捕获并固定基底上的胶体粒子。通过引导激光束移动微气泡，我们创建了具有不同分辨率和结构的任意单粒子图案和粒子组装体。此外，我们已将BPL应用于在等离子体基底上对CdSe/ZnS量子点以及在二维原子层材料上对聚苯乙烯（PS）微粒进行图案化。由于其低功率操作、任意图案化以及对一般胶体粒子的适用性，BPL将在微电子学、纳米光子学和纳米医学中获得广泛应用。
Current lithography techniques, which employ photon, electron, or ion beams to induce chemical or physical reactions for micro/nano-fabrication, have remained challenging in patterning chemically synthesized colloidal particles, which are emerging as building blocks for functional devices. Herein, we develop a new technique - bubble-pen lithography (BPL) - to pattern colloidal particles on substrates using optically controlled microbubbles. Briefly, a single laser beam generates a microbubble at the interface of colloidal suspension and a plasmonic substrate via plasmon-enhanced photothermal effects. The microbubble captures and immobilizes the colloidal particles on the substrate through coordinated actions of Marangoni convection, surface tension, gas pressure, and substrate adhesion. Through directing the laser beam to move the microbubble, we create arbitrary single-particle patterns and particle assemblies with different resolutions and architectures. Furthermore, we have applied BPL to pattern CdSe/ZnS quantum dots on plasmonic substrates and polystyrene (PS) microparticles on two-dimensional (2D) atomic-layer materials. With the low-power operation, arbitrary patterning and applicability to general colloidal particles, BPL will find a wide range of applications in microelectronics, nanophotonics, and nanomedicine.