Fabrication of 2-and 3-dimensional nanostructures
Fabrication of 2-and 3-dimensional nanostructures
复制标题
DOI：
10.1142/s021797920100749x
复制
发表时间：
2001-10-10
影响因子：
1.7
通讯作者：
Robertson, BW
中科院分区：
文献类型：
--
作者：
Jiang, H;Borca, CN;Robertson, BW
在用于制造周期性和非周期性纳米结构和纳米器件的工具中，电子束诱导有机金属化学气相沉积（E-OMCVD）提供了一种高度灵活且可控的一步沉积工艺。 E-OMCVD 能够实现纳米级研究和定制结构的无掩模制造，其最小尺寸接近或低于 10 纳米，而其他方法在这一尺度上被证明是困难或昂贵的。使用改进的 HB501 场发射扫描透射电子显微镜 (STEM) 中的聚焦电子束，可以定义和沉积具有均匀厚度和明确形状的焊盘和导线。尽管制造最小沉积物的条件尚未优化，但沉积物的边缘锐度（锐度）始终低至 4nm 或更小，相应的最小线宽为 8nm。在不同的沉积条件下，制备了三维开放结构纳米网络。给出了茂金属化合物二茂镍 (Ni(C(5)H(5))(2)) 作为有机金属源的 E-OMCVD 参数研究结果。
Amongst tools for fabricating periodic and aperiodic nanostructures and nanodevices, electron beam-induced organometallic chemical vapor deposition (E-OMCVD) offers a highly flexible and controllable one-step deposition process. E-OMCVD enables maskless fabrication of nanoscale research and custom structures that have least dimensions near or below 10nm - a scale at which other methods prove difficult or costly. Using the focused electron beam in a modified HB501 field-emission scanning transmission electron microscope (STEM), pads and wires with uniform thickness and well-defined shapes have been defined and deposited. Although conditions for fabricating the smallest deposits have not yet been optimized, the edge acuity (sharpness) of the deposits is consistently as low as 4nm or less and the corresponding smallest wire width is 8nm. Under different deposition conditions, three-dimensional open structured nanonetworks have been fabricated. Results of an investigation of E-OMCVD parameters are presented for the metallocene compound, nickelocene (Ni(C(5)H(5))(2)), as source organometallic.