Dynamic determination of secondary electron emission using a calorimetric probe in a plasma immersion ion implantation experiment
Dynamic determination of secondary electron emission using a calorimetric probe in a plasma immersion ion implantation experiment
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DOI：
10.1088/1361-6595/aabb2d
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发表时间：
2018-04
影响因子：
3.8
通讯作者：
F. Haase;D. Manova;D. Hirsch;S. Mändl;H. Kersten
中科院分区：
文献类型：
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作者：
F. Haase;D. Manova;D. Hirsch;S. Mändl;H. Kersten
被动热探针已被用来检测二次电子发射（SEE）的动态变化。在等离子体浸没离子注入工艺中，在氩离子溅射期间已经研究了氧化和氮化材料。相同的测量已经进行了金属状态与高电压脉冲加速氮离子向表面，据推测形成氮化物层。将能通量数据与表面的扫描电子显微镜图像相结合，以获得有关实际表面组成以及过程中趋势和变化的信息。在测量范围内，可以直接比较两种所采用的离子种类（氩和氮）内的SEE，同时绝对定量仍然是开放的。此外，所研究的氧化物和氮化物层的标称成分并不总是对应于化学计量的化合物。然而，氧化物显示出显着更高的SEE相比，纯金属，而观察到的氮化物的一个模糊的行为：一些高于，一些低于清洁的金属表面。对于铝合金AlMg 3，观察到复杂的时间依赖性演变，连续的氧化/溅射循环导致非常粗糙的表面，氧化物层减少，导致金属的几乎黑色表面和SEE的不可再现的变化。所提出的方法是一种通用的技术，用于测量PVD工艺中常用的材料表面的动态变化，时间分辨率约为1分钟，例如磁控溅射或HiPIMS，其中靶或电极成分发生变化，但不能直接测量。
A passive thermal probe has been used to detect dynamic changes in the secondary electron emission (SEE). Oxidized and nitrided materials have been studied during argon ion sputtering in a plasma immersion ion implantation process. Identical measurements have been performed for the metallic state with high voltage pulses accelerating nitrogen ions towards the surface, supposedly forming a nitride layer. Energy flux data were combined with scanning electron microscopy images of the surface to obtain information about the actual surface composition as well as trends and changes during the process. Within the measurements, a direct comparison of the SEE within both employed ion species (argon and nitrogen) is possible while an absolute quantification is still open. Additionally, the nominal composition of the investigated oxide and nitride layers does not always correspond to stoichiometric compounds. Nevertheless, the oxides showed a remarkably higher SEE compared to the pure metals, while an indistinct behavior was observed for the nitrides: some higher, some lower than the clean metal surfaces. For the aluminum alloy AlMg3 a complex time dependent evolution was observed with consecutive oxidation/sputtering cycles leading to a very rough surface with a diminished oxide layer, leading to an almost black surface of the metal and non-reproducible changes in the SEE. The presented method is a versatile technique for measuring dynamic changes of the surface for materials commonly used in PVD processes with a time resolution of about 1 min, e.g. magnetron sputtering or HiPIMS, where changes in the target or electrode composition are occurring but cannot be measured directly.