Positive and negative nanohole-fabrication on glass surface by femtosecond laser with template of polystyrene particle array
Positive and negative nanohole-fabrication on glass surface by femtosecond laser with template of polystyrene particle array
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DOI：
10.1088/0022-3727/40/7/036
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发表时间：
2007-04-07
影响因子：
3.4
通讯作者：
Obara, Minoru
中科院分区：
文献类型：
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作者：
Sakai, Tetsuo;Nedyalkov, Nikolay;Obara, Minoru
我们展示了一种新的纳米加工技术，使用近电磁场周围的一个小的透明颗粒照射820 nm的飞秒激光脉冲。我们制作了一个二维纳米孔阵列的负和正的钠钙玻璃表面上的图案，通过照射一个单层的直径为790 nm的聚苯乙烯（PS）颗粒，排列在一个紧密堆积的六方晶格，与飞秒激光脉冲。在较低的激光能量密度域，由于米氏散射，PS颗粒充当聚焦透镜和/或近场增强剂;它使纳米孔加工正好在颗粒下方（正图案化）。在这种制度下，直径范围从84至170 nm的纳米孔制造。在较高的注量域，PS颗粒充当掩模;当正纳米孔形成消失时，它能够在与颗粒之间区域对应的间隙区域中对表面进行纳米图案化（负图案化）。在这种情况下，制造的纳米孔的直径范围从65至110 nm。实验上首次证明了通过简单地控制入射激光能量密度可以实现正负纳米图形的切换。通过近场分布的FDTD模拟，给出了正负图形切换的简单理论解释。
We demonstrate a new nano-processing technique using the near-electromagnetic field around a small transparent particle irradiated by an 820 nm femtosecond laser pulse. We fabricate a 2D nanohole array with negative and positive patterns on a soda lime glass surface by irradiating a monolayer of 790 nm diameter polystyrene (PS) particles, arranged in a close-packed hexagonal lattice, with a femtosecond laser pulse. At the lower laser fluence domain, PS particles act as focusing lenses and/or near-field enhancers due to Mie scattering; it enables nanohole processing just under the particle (positive patterning). Nanoholes with diameters ranging from 84 to 170 nm are fabricated in this regime. At the higher fluence domain, the PS particle acts as a mask; while the positive nanohole formation disappears, then it enables nano-patterning of the surface in gap areas corresponding to the region between particles (negative patterning). Nanoholes with diameters ranging from 65 to 110 nm are fabricated in this case. The switching of negative and positive nano-patterning by simply controlling the incident laser fluence is experimentally demonstrated for the first time to our knowledge. A simple theoretical explanation for the switching of the positive and negative patterning is presented by FDTD simulation of the near-field distribution.