Oxide Films for Integrated Capacitors in Thin Film Functional Modules

Oxide Films for Integrated Capacitors in Thin Film Functional Modules
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薄膜功能模块中集成电容器的氧化膜

DOI:
10.1557/proc-655-cc13.1.1
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发表时间:
2000
期刊:
影响因子:
--
通讯作者:
P. Lok
P. Lok
中科院分区:
--
文献类型:
--
作者:
M. Klee;D. Wissen;W. Keur;R. Kiewitt;D. Bausen;P. Lok

文献摘要

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Single oxide films as well as complex oxide films are intensively studied for multi-chip modules with integrated passive functions. In this paper the processing and properties of oxide films such as Ta 2 O 5 , TiO 2 , Nb 2 O5, Ta 2 O 5 -Al 2 O 3 , Ta 2 O 5 –Nb 2 O 5 as well as complex oxide films such as BiNbO 4 and Ba 1划x Sr x TiO 3 films will be discussed with respect to their integration into thin film functional modules.