Connectivity of features in microlens array reduction photolithography: generation of various patterns with a single photomask.
Connectivity of features in microlens array reduction photolithography: generation of various patterns with a single photomask.
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DOI：
10.1021/ja020551k
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发表时间：
2002-06
影响因子：
15
通讯作者：
Hongkai Wu;Teri W. Odom;G. Whitesides
中科院分区：
文献类型：
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作者：
Hongkai Wu;Teri W. Odom;G. Whitesides
微透镜阵列光刻技术（MAP）是一种将微透镜阵列放置在光刻胶附近的技术，该技术可以在光掩膜上缩小厘米大小的图形，并在光刻胶上形成微米级图像。这项工作表明，使用单个掩模的MAP可以产生与透镜阵列具有不同对称性和周期性的图案。MAP的这种能力取决于(i)单个微透镜产生的图像之间的连通性和（ii）曝光前相对于透镜阵列的掩模方向。通过改变这个方向，MAP，使用单个掩模和单个微透镜阵列，可以用来生成(i)彼此分离，（ii）相互重叠，（iii）具有2D手性，因此在对称性上不同于透镜阵列和掩模，（iv）比透镜阵列的对称性减少，或(v)具有比透镜阵列更小的单位胞和更小的间距。
Microlens array photolithography (MAP) is a technique in which arrays of microlenses positioned close to photoresist reduce cm-sized figures on photomasks and form mum-scale images in the photoresist. This work demonstrates that MAP, using a single photomask, can generate patterns having different symmetries and periodicities from that of the lens array. This capability of MAP depends on (i) the connectivity between the images produced by individual microlenses and (ii) the orientation of the photomask relative to the lens array prior to exposure. By changing this orientation, MAP, using a single mask and a single array of microlenses, could be used to generate patterns that (i) are separated from each other, (ii) overlap with each other, (iii) are 2D chiral, and thus different from both the lens array and the mask in symmetry, (iv) have a symmetry reduced from that of the lens array, or (v) have a smaller unit cell and smaller pitch than that of the lens array.