Design and fabrication of enhanced lateral growth for dislocation reduction in GaN using nanodashes
Design and fabrication of enhanced lateral growth for dislocation reduction in GaN using nanodashes
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DOI:
10.1016/j.jcrysgro.2017.02.047
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发表时间:
2017-05
影响因子:
1.8
通讯作者:
E. D. Boulbar;J. Priesol;M. Nouf-Allehiani;G. Naresh-Kumar;S. Fox;C. Trager-Cowan;A. Šatka;D. A
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文献类型:
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作者:
E. D. Boulbar;J. Priesol;M. Nouf-Allehiani;G. Naresh-Kumar;S. Fox;C. Trager-Cowan;A. Šatka;D. A