Design and fabrication of enhanced lateral growth for dislocation reduction in GaN using nanodashes

Design and fabrication of enhanced lateral growth for dislocation reduction in GaN using nanodashes
复制标题

DOI:
10.1016/j.jcrysgro.2017.02.047
复制
发表时间:
2017-05
影响因子:
1.8
通讯作者:
E. D. Boulbar;J. Priesol;M. Nouf-Allehiani;G. Naresh-Kumar;S. Fox;C. Trager-Cowan;A. Šatka;D. A
E. D. Boulbar;J. Priesol;M. Nouf-Allehiani;G. Naresh-Kumar;S. Fox;C. Trager-Cowan;A. Šatka;D. A
中科院分区:
材料科学3区
文献类型:
--
作者:
E. D. Boulbar;J. Priesol;M. Nouf-Allehiani;G. Naresh-Kumar;S. Fox;C. Trager-Cowan;A. Šatka;D. A

文献摘要

被引文献

相似文献