Mesoporous Metal Nitride Materials Prepared from Bulk Oxides
Mesoporous Metal Nitride Materials Prepared from Bulk Oxides
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DOI：
10.1111/j.1551-2916.2012.05351.x
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发表时间：
2012-10
影响因子：
3.9
通讯作者：
Minghui Yang;Michelle Macleod;F. Tessier;F. Disalvo
中科院分区：
文献类型：
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作者：
Minghui Yang;Michelle Macleod;F. Tessier;F. Disalvo
由于需要较高的烧结温度和/或较长的反应时间，在纳米或介观尺度上制备金属氮化物材料是具有挑战性的。在这里，我们提出了一种新的、简单的方法来制备介孔过渡金属氮化物，而不使用纳米颗粒或其他模板。用氨解法制备了VN、TiN、CrN、Ta3N5、TaN、NbN、WN、MON和Mo2N介孔材料。用Rietveld粉末X射线衍射仪、扫描电子显微镜和氮气吸附/脱附分析对产物进行了表征。结果表明，这些材料的孔径在10~50 nm之间。通过改变前驱体的化学计量比、过渡金属和工艺条件，得到了许多不同的介孔形貌。这些材料具有较高的比表面积和良好的导电性。
The preparation of metal nitride materials structured on the nano or mesoscale is challenging due to the need for high sintering temperatures and/or long reaction times. Here, we present a new and simple process for preparing mesoporous transition metal nitrides without the use of nanopatterning or other templating. Mesoporous VN, TiN, CrN, Ta3N5, TaN, NbN, WN, MoN, and Mo2N are obtained by the ammonolysis of bulk ternary oxides containing Zn. The products were characterized by Rietveld refinement of powder X-ray diffraction (PXRD) patterns, scanning electron microscopy (SEM), and nitrogen adsorption/desorption analysis. Our results demonstrate that the pore sizes of these materials range from 10 to 50 nm. By varying the precursor stoichiometry, the transition metal, and processing conditions, many different mesoporous morphologies are obtained. These materials show high surface area and good electrical conductivity.