Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experiments
Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experiments
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DOI：
10.1088/0022-3727/26/6/019
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发表时间：
1993-06
期刊：
影响因子：
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通讯作者：
A. Howling;L. Sansonnens;J. Dorier;C. Hollenstein
中科院分区：
文献类型：
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作者：
A. Howling;L. Sansonnens;J. Dorier;C. Hollenstein
在用于非晶硅沉积的射频功率调制硅烷等离子体中，通过质谱法测量了含有多达16个硅原子的稳定负离子。这些氢化硅簇离子达到比正离子高得多的质量，正离子不超过六个硅原子。这支持了负离子是硅烷等离子体中颗粒形成的前体的观点。从等离子体的正离子和负离子的随时间变化的通量显示与5 μ s的时间分辨率。可能的簇反应序列进行了讨论，并评论了可见光对负离子信号的影响。
Stable negative ions containing up to sixteen silicon atoms have been measured by mass spectrometry in RF power-modulated silane plasmas for amorphous silicon deposition. These hydrogenated silicon cluster ions reach much higher masses than the positive ions, which have no more then six silicon atoms. This supports the view that negative ions are the precursors to particulate formation in silane plasmas. The time-dependent fluxes of positive and negative ions from the plasma are shown with a 5 mu s time resolution. Possible cluster reaction sequences are discussed and the effect of visible light on the negative ion signal is commented upon.