Recovery prevention via pressure control in thermal nanoimprint lithography
Recovery prevention via pressure control in thermal nanoimprint lithography
复制标题
通过热纳米压印光刻中的压力控制来防止恢复
DOI：
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发表时间：
2009
期刊：
影响因子：
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通讯作者：
A. Mayer
中科院分区：
文献类型：
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作者：
H. Scheer;N. Bogdanski;S. Möllenbeck;A. Mayer
为了研究纳米压印光刻过程中宽图案下方的不均匀性，对压印过程中的压力情况进行了详细分析。垂直力的平衡表明，腔内的气体压力可以忽略不计，而作用在与聚合物接触的印模结构上的有效压力与外部施加的压力相比增加了。该有效压力具有高的流体静力分量，这可能导致局部印模变形。用低分子量聚合物压印提供了印模结构在高压下被压缩的证据，导致压印图案下方的不均匀残留层。相比之下，单个印模结构的弯曲变形被发现是可以忽略的。减压可有效减少印模压缩，提高残留层的均匀性。然而，对于中等分子量的典型压印聚合物，压力降低降低了总体压印深度。
In order to investigate the nonuniformity occurring below wider patterns during thermal nanoimprint lithography, the pressure situation is analyzed in detail. A balance of vertical forces shows that the gas pressure within the cavities is negligible, whereas the effective pressure acting on the stamp structures in contact to the polymer is increased compared to the externally applied pressure. This effective pressure has a high hydrostatic component, which may result in local stamp deformation. Imprint with a low molecular weight polymer provides evidence that the stamp structures become compressed under high pressure, resulting in a nonuniform residual layer beneath the imprinted patterns. In contrast, bending deformation of single stamp structures is found to be negligible. Pressure reduction is effective to reduce stamp compression, improving the uniformity of the residual layer. With typical imprint polymers of medium molecular weight, however, pressure reduction reduces the overall imprint depth.