Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples
Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples
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DOI：
10.3390/cryst11050546
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发表时间：
2021-05-01
期刊：
影响因子：
2.7
通讯作者：
Wintz, Sebastian
中科院分区：
文献类型：
--
作者：
Mayr, Sina;Finizio, Simone;Wintz, Sebastian
我们采用氙（Xe）等离子体聚焦离子束（PFIB）铣削获得软X射线透明窗口的大块样品。使用一个可编程PFIB允许铣削薄窗口（几个100纳米厚）与100 μ m × 100 μ m的数量级的区域到体衬底。此外，我们提出了一种方法来经验性地确定在制造过程中，通过关联它们的电子和软X射线的透射水平的窗口。我们进行扫描透射X射线显微镜（STXM）成像的样品上获得的CNOPFIB铣削，以证明该技术的概念可行性。我们的减薄方法提供了一种快速和简化的方法，以促进外延样品的软X射线透射率测量，它可以应用于各种不同的样品系统和衬底，否则无法访问。
We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 mu m x 100 mu m into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible.