EUV discharge light source based on a dense plasma focus operated with positive and negative polarity
EUV discharge light source based on a dense plasma focus operated with positive and negative polarity
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基于正负极性操作的密集等离子体焦点的 EUV 放电光源
DOI：
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
W. Partlo
中科院分区：
文献类型：
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作者：
I. Fomenkov;N. Bowering;C. Rettig;S. Melnychuk;I. Oliver;J. Hoffman;O. Khodykin;Richard M. Ness;W. Partlo
讨论了密集等离子体聚焦箍缩放电作为极紫外（EUV）光刻光源的应用。对于氙气操作，以时间、光谱或空间分辨率分析 13.5 nm 左右发射的辐射。我们描述并比较了在充电电压的正极性和负极性下通电时器件的工作特性和等离子体动力学。对两种配置的热负荷分布、热沉积和电极磨损进行了测量和比较。高重复率突发模式数据显示特征瞬态。当使用锡粉作为目标元素时，也可以获得源尺寸数据。在负极性下进行夹点放电操作通常可以获得更有利的性能特征。
The application of a dense plasma focus pinch discharge as a light source for extreme ultraviolet (EUV) lithography is discussed. For operation with xenon gas, the radiation emitted at around 13.5 nm is analysed with temporal, spectral or spatial resolution. We describe and compare the operating characteristics and plasma dynamics of the device when energized at positive and negative polarity of the charging voltage. The thermal load distribution, heat deposition and wear of the electrodes are measured and compared for both configurations. High-repetition rate burst mode data show characteristic transients. Source size data are also obtained when tin powder is used as the target element. More favourable performance characteristics were generally obtained for operation of the pinch discharge at negative polarity.