Multi-direction digital moving mask method for fabricating continuous microstructures
Multi-direction digital moving mask method for fabricating continuous microstructures
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DOI：
10.5277/oa150108
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发表时间：
2015
期刊：
影响因子：
0.6
通讯作者：
Zhimin Zhang;Yiqing Gao;N. Luo;Kejun Zhong;Zhihuai Liu;Jiangxi Lianchuang
中科院分区：
文献类型：
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作者：
Zhimin Zhang;Yiqing Gao;N. Luo;Kejun Zhong;Zhihuai Liu;Jiangxi Lianchuang
为了制备连续微结构，提出了一种多方向数字移动掩模方法，该方法利用不同移动方向的曝光叠加。通过在相应的移动方向上投射目标剂量剖面来确定与每个移动方向相对应的掩模图案。所有掩模图案一层一层地动态暴露在同一基底上，以形成暴露剂量的三维轮廓。讨论了量化数和运动方向数的选择准则。为了验证多方向移动方法的正确性，通过实验制作了沿两个正交方向移动的方形金字塔阵列和方形基微透镜阵列，以及沿六个方向移动的圆形基微透镜阵列。
The multi-direction digital moving mask method, employing the superposition of the exposure along various moving directions, is developed for fabricating continuous microstructures. The mask pattern corresponding to each moving direction is determined by projecting the target dose profile in the corresponding moving direction. All the mask patterns are dynamically exposed on the same substrate layer by layer so as to form a 3D profile of the exposure dose. The selection criterion of a quantization number and moving-direction number is discussed. For verification of the multi-direction moving method, experiments are performed to fabricate a square pyramid array and square-based microlens array by moving along two orthogonal directions, and round-based microlens array by moving along six directions.