Monolithic design of a compliant template orientation stage for step imprint lithography
Monolithic design of a compliant template orientation stage for step imprint lithography
复制标题
DOI：
10.1177/0954405411418752
复制
发表时间：
2012-02
期刊：
影响因子：
--
通讯作者：
J. Shao;Y.C. Ding;H.Z. Liu;X-M Li;Hongmiao Tian;B-H Xiao
中科院分区：
文献类型：
--
作者：
J. Shao;Y.C. Ding;H.Z. Liu;X-M Li;Hongmiao Tian;B-H Xiao
在步进压印光刻中，模板与基片之间的平行表面接触对图形的保真度至关重要。被动柔顺工作台是一种有效的姿态调节机构，其结构比主动控制工作台简单得多。对于一个完美的被动柔顺平台，方位调整过程应该带来尽可能小的附加横向运动，以保持重叠精度。本文在分析柔顺工作台结构和旋转轴对位置偏移影响的基础上，提出了一种具有四组被动柔顺机构的单片模板定位工作台，以满足上述要求。该柔性模板定向台可视为两个相互干涉的四连杆机构，每组两个柔性铰链的连接线穿过模板的中心，确保在整个定向调整过程中旋转轴位于模板的中心。采用有限元分析方法和实验研究了所设计的柔性模板定位平台的性能。结果表明，这种柔性模板平台可以确保模板和晶片之间的平行表面接触，同时最大限度地减少压印过程中的相对横向运动。
The parallel surface contact between a template and a wafer is of critical importance for pattern fidelity in step imprint lithography. The passive compliant stage, which has a much simpler structure than an active control one, is an effective orientation-adjusting mechanism. For a perfect passive compliant stage, the orientation-adjusting process should bring about the smallest possible additional lateral motion to maintain the overlay precision. In the present paper, based on the analysis of a compliant wafer stage and the influence of the rotation axis on position shift, a monolithic template orientation stage with four groups of passive compliant mechanisms is proposed to satisfy the above requirements. This compliant template orientation stage can be regarded as two four-bar linkages that interfere with each other, with the connecting line of two flexible hinges in each group passing through the centre of the template, ensuring that the rotation axis is located in the centre of the template during the whole orientation-adjusting process. The performance of the designed compliant template orientation stage is researched using the finite element analysis method and experiments. The results indicate that this compliant template stage can ensure the parallel surface contact between a template and a wafer while minimizing relative lateral motion during the imprinting process.