Photoresponsive Surfaces with Two Independent Wavelength-Selective Functional Levels
Photoresponsive Surfaces with Two Independent Wavelength-Selective Functional Levels
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DOI：
10.1021/la802052u
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发表时间：
2008-10-21
期刊：
影响因子：
3.9
通讯作者：
del Campo, Aranzazu
中科院分区：
文献类型：
--
作者：
Stegmaier, Petra;Alonso, Jose Maria;del Campo, Aranzazu
两个光可去除的保护基团，即，硝基香豆素基氧羰基（NVo）和二乙基氨基香豆素-4-基（DEACM），已被测试的波长选择性，独立的去除。将发色团连接到氨基丙基三乙氧基硅烷的胺基上，并用于二氧化硅表面的改性。的光敏层上的光解实验使我们能够确定的选择性裂解的发色团的照射条件。UV测量显示，光不稳定的DEACM基团可以用412 nm的UV光裂解而不损伤NVo基团。然后可以在365 nm处去除NVo基团。用两种硅烷的I：I摩尔混合物改性的基底的掩蔽照射允许在顺序照射过程中选择性裂解DEACM和NVo后产生双官能图案。脱保护反应通过将两种不同的荧光染料偶联到释放的胺基来确认。通过荧光显微镜可以观察到预期的双色图案。
Two photoremovable protecting groups, namely, nitroveratryloxycarbonyl (NVo) and diethylamino-coumarin-4-yl (DEACM), have been tested for wavelength-selective, independent removal. The chromophores were attached to the amine group of aminopropyltriethoxysilane and used for the modification of silica surfaces. A photolytic experiment on the photosensitive layers allowed us to identify the irradiation conditions for the selective cleavage of the chromophores. UV measurements revealed that the photolabile DEACM group can be cleaved off with UV light at 412 nm without damaging the NVo group. The NVo group could then be removed at 365 nm. Masked irradiation of substrates modified with a I: I molar mixture of both silanes allowed the generation of bifunctional patterns after the selective cleavage of DEACM and NVo in a sequential irradiation process. The deprotection reaction was confirmed by coupling two different fluorescent dyes to the liberated amine groups. The expected two-color pattern could be observed by fluorescence microscopy.