Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)
Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)
复制标题
减少对环境影响的光刻胶设计。
DOI：
10.1021/cm980603y
复制
发表时间：
1999
影响因子：
8.6
通讯作者：
J. Byers
中科院分区：
文献类型：
--
作者：
J. M. Havard;Sang;J. Fréchet;Q. Lin;D. Medeiros;C. Willson;J. Byers
基于聚乙烯醇（PVA）基体树脂交联的化学放大型全水溶性负性抗蚀剂的可行性已经得到证实。将含有 PVA 和（2,4-二羟基苯基）二甲锍三氟甲磺酸盐作为水溶性光酸产生剂的双组分光刻胶在去离子水中配制，并旋涂到裸露的硅片上。在 254 nm 照射、后烘烤以及随后在纯水中显影后获得负色调图像。双组分抗蚀剂在显影过程中会发生膨胀，但通过添加交联剂六甲氧基甲基三聚氰胺（HMMM）获得了改进的性能。由此产生的三组分水溶性抗蚀剂能够使用 248 nm 步进器以约 100 的剂量解析微米尺寸的图像。 200 毫焦耳/平方厘米。使用 13C NMR 监测以 2,4-戊二醇作为 PVA 模型进行的模型研究表明，在酸性催化下 HMMM 反应形成活性亲电子物质，从而增加...
The feasibility of a chemically amplified fully water-soluble negative-tone resist based upon the cross-linking of a poly(vinyl alcohol) (PVA) matrix resin has been demonstrated. Two-component resists incorporating PVA and (2,4-dihydroxyphenyl)dimethylsulfonium triflate as a water-soluble photoacid generator were formulated in deionized water and spin-coated onto bare silicon wafers. Negative-tone images were obtained upon irradiation at 254 nm, postbaking, and subsequent development in pure water. The two-component resist suffered from swelling during development, but improved performance was obtained through the addition of a cross-linking agent, hexamethoxymethylmelamine (HMMM). The resulting three-component, water-soluble resist was able to resolve micron-sized images using a 248 nm stepper, at a dose of ca. 200 mJ/cm2. Model studies conducted using 13C NMR monitoring with 2,4-pentanediol as a model for PVA showed that under acidic catalysis HMMM reacts to form active electrophilic species that add to...