ENERGY FORMATION OF ANTISITE DEFECTS IN DOPED SB2TE3 AND BI2TE3 CRYSTALS
ENERGY FORMATION OF ANTISITE DEFECTS IN DOPED SB2TE3 AND BI2TE3 CRYSTALS
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DOI:
10.1016/0022-3697(86)90010-7
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发表时间:
1986-01-01
影响因子:
4
通讯作者:
KOUDELKA, L
中科院分区:
文献类型:
--
作者:
HORAK, J;CERMAK, K;KOUDELKA, L
The free carrier concentration of the Sb2−xInxTe3, Bi2−xInxTe3and Bi2Te3−xSxcrystals has been determined from the values of the Hall constants and the free carrier concentration of the Sb2−xTlxTe3has been calculated from the plasma resonance frequency; with increasing value ofx, the hole concentration decreases. As the incorporation of the elements In, Tl and S into the lattice Sb2Te3or Bi2Te3, respectively, gives rise to the uncharged defects InxSb, TlxSb, InxBiand SxTe, thexcauses the decrease of the antisite defects concentration. The proven effect is explained in the following way: the antisite defects can be created only in crystals whose atoms are bound by weakly polarized bonds. The incorporation of In, Tl and S atoms into the crystal lattice of Sb2Te3or Bi2Te3increases the bond polarity, the ionicity of ternary crystals increases. This unfavorably affects the increase of antisite defects whose concentration decreases. The change of the bond polarity is considered from the changes discovered in the formation energy of antisite defects of the above mentioned ternary crystals.