A Study of the Critical Factor Determining the Size of Etched Latent Tracks Formed on SiO2 Glass by Swift-Cl-ion Irradiation

A Study of the Critical Factor Determining the Size of Etched Latent Tracks Formed on SiO2 Glass by Swift-Cl-ion Irradiation
复制标题

影响SiO2玻璃上Swift-Cl离子辐照刻蚀潜迹尺寸关键因素的研究

DOI：
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发表时间：
2012
期刊：
Nuclear Instruments & Methods in Physics Research, Section B-Beam Interactions with Materials and Atoms
影响因子：
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通讯作者：
and Tetsuro Komatsubara
and Tetsuro Komatsubara
中科院分区：
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文献类型：
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作者：
Ken-ichi Nomura;Yoshimichi Ohki;Makoto Fujimaki;Xiaomin Wang;Koichi Awazu;and Tetsuro Komatsubara

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