Interaction of multiple plasma plumes in an atmospheric pressure plasma jet array
Interaction of multiple plasma plumes in an atmospheric pressure plasma jet array
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DOI：
10.1088/0022-3727/46/5/052001
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发表时间：
2013-02-06
影响因子：
3.4
通讯作者：
Walsh, J. L.
中科院分区：
文献类型：
--
作者：
Ghasemi, M.;Olszewski, P.;Walsh, J. L.
等离子体射流阵列被认为是一种可行的方法，可以提高下游表面处理的规模，而不是使用单一的等离子体射流。在许多加工应用中，最重要的是衬底上等离子体曝光的一致性，当多个等离子体喷嘴由于相互作用而排列得很近时，这一点可能会受到影响。这篇文章探索了一种由多个单独镇流的喷嘴组成的介质阻挡等离子喷嘴阵列。结果表明，电容式镇流是一种很有前途的技术，它允许等离子体羽流同时运行，而不会产生与阻性镇流相关的损失。用纹影成像研究了相邻等离子体羽流与背景气体的相互作用，结果表明，每个等离子体羽流之间的强烈斥力导致传播轨迹的发散和层流长度的缩短，这对任何后续的表面处理都有重要的影响。
Plasma jet arrays are considered a viable means to enhance the scale of a downstream surface treatment beyond that possible using a single plasma jet. Of paramount importance in many processing applications is the uniformity of the plasma exposure on the substrate, which can be compromised when multiple plasma jets are arranged in close proximity due to their interaction. This contribution explores a dielectric barrier plasma jet array consisting of multiple individually ballasted jets. It is shown that capacitive ballasting is a promising technique to allow simultaneous operation of the plasma plumes without the losses associated with resistive ballasting. The interaction between adjacent plasma plumes and the background gas is investigated with Schlieren imaging; it is shown that the strong repulsive force between each plasma plume causes a divergence in propagation trajectory and a reduction in the laminar flow length with significant ramifications for any downstream surface treatment.