Study of the adsorption reactions of thiophene on Cu(I)/HY-Al2O3 by Fourier transform infrared and temperature-programmed desorption: adsorption, desorption, and sorbent regeneration mechanisms.
Study of the adsorption reactions of thiophene on Cu(I)/HY-Al2O3 by Fourier transform infrared and temperature-programmed desorption: adsorption, desorption, and sorbent regeneration mechanisms.
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DOI：
10.1021/la2025654
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发表时间：
2011-09
期刊：
影响因子：
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通讯作者：
Xiao-lin Tang;Li Shi
中科院分区：
文献类型：
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作者：
Xiao-lin Tang;Li Shi
本文主要研究了噻吩在Cu（I）负载的HY-Al（2）O（3）上的吸附行为。当HY/Al（2）O（3）质量比为3，负载12%的铜，在550 °C下煅烧，室温下测试时，其硫容量为10 mg S/g吸附剂。原位傅里叶变换红外光谱（FTIR）和程序升温脱附（TPD）结果表明，Cu（I）/HY-Al（2）O（3）吸附机理主要为π络合和硫吸附（S-M; σ）键。吡啶-FTIR表明总的弱刘易斯酸对Cu（I）/HY-Al（2）O（3）吸附脱硫性能有贡献。
This work mainly involved the investigation of the adsorption of thiophene on Cu(I)-supported HY-Al(2)O(3). It demonstrated a high sulfur capacity of 10 mg sulfur/g sorbent when the HY/Al(2)O(3) mass ratio was 3, loaded with 12% copper, calcined at 550 °C, and tested at ambient temperature. In situ Fourier transform infrared (FTIR) and temperature-programmed desorption (TPD) results indicated that the adsorption mechanisms on Cu(I)/HY-Al(2)O(3) primarily were π-complexation and sulfur-adsorbent (S-M; σ) bonds. Pyridine-FTIR showed the total weak Lewis acid contribution to the Cu(I)/HY-Al(2)O(3) adsorption desulfurization performance.