Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrates
Fabrication of transmission color filters using silicon subwavelength gratings on quartz substrates
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DOI：
10.1109/lpt.2006.883208
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发表时间：
2006-09-01
影响因子：
2.6
通讯作者：
Hane, Kazuhiro
中科院分区：
文献类型：
--
作者：
Kanamori, Yoshiaki;Shimono, Masaya;Hane, Kazuhiro
我们从理论上和实验上研究了在石英基板上使用硅亚波长光栅的透射滤色片。每个光栅面积为120μm见方，适合显示器和多通道探测器的像素尺寸。在制造过程中，使用了电子束光刻和快速原子束蚀刻。红色、绿色和蓝色滤光片的光栅周期分别为 400、350 和 440 nm。通过入射光和亚微米周期性光栅之间的耦合获得的透射光谱与人类的颜色感知相匹配。红色、绿色和蓝色滤光片的透射率分别为 71.1%、58.1% 和 59.3%。
We investigate theoretically and experimentally transmission color filters using silicon subwavelength gratings on quartz substrates. Each grating area is 120 mu m-square, which is suitable pixel size for displays and multichannel detectors. In the fabrication, electron beam lithography and fast atom beam etching are used. The grating periods are 400, 350, and 440 nm for the red, green, and blue filters, respectively. The transmission spectrum obtained from a coupling between an incident light and the submicrometer periodic grating matches with human color perception. The transmittances of 71.1%, 58.1%, and 59.3% are obtained for the red, green, and blue filters, respectively.