Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility
Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility
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NewSUBARU 同步加速器光设施的 EUV 光刻基础研究活动
DOI：
10.1117/12.2600896
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Yamakawa S.
中科院分区：
文献类型：
--
作者：
Watanabe Takeo;Harada T.;Yamakawa S.
介绍了NewSuBARU同步加速器光设施的抗蚀剂、掩模和光学器件的最新EUVL活动。此外，还讨论了用高功率极紫外光光源将波长缩短到6.75 nm的能力。
The recent EUVL activities of resists, masks, and optics at NewSUBARU Synchrotron Light Facility are introduced. In addition, the capabilities of the shortening the wavelength to 6.75 nm with high-power EUV source are also discussed.