Patterning-Area Expansion of Parabolic-Mirror Projection Optics for Lithography Using One-Sided and Collimated Illumination
Patterning-Area Expansion of Parabolic-Mirror Projection Optics for Lithography Using One-Sided and Collimated Illumination
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发表时间：
2022
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通讯作者：
Toshiyuki Horiuchi;J. Iwasaki;Hiroshi Kobayashi
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作者：
Toshiyuki Horiuchi;J. Iwasaki;Hiroshi Kobayashi
研究背景：穿戴式健康监护仪因能有效掌握病人和老年人的病情而受到关注。并且，用于附着到身体部位（例如，手指和胸部）的各种传感器正在开发中。传感器及其附接部件通常使用柔性平板制成。然而，通常最好是在弯曲的柔性或可弯曲的壳体或刚好适合身体部位的固体部件上制造它们。为此，发明了一种简单且低成本的方法，可以在任意曲面上打印50-200 µm的图案，使用由抛物面镜组成的魔镜系统。在过去的研究中，放置在下镜孔径处的透明标线上的200微米L&S图案被投射到上镜孔径中。然而，成功图案化的区域仅限于场中心。因此，有必要将图案化区域扩展到整个曝光场。扩大图案化区域的方法研究：首先，通过几何追踪成像光线并计算投影图像位置来检查在整个场中没有形成抗蚀剂图案的原因。发现图像位置根据照明方向和光线路径而变化，并且图像位置尤其在曝光场的外部部分处变化。因此，认为通过准直光从一侧照射掩模版是有效的。所以，曝光系统被翻新了。将使用环形灯的圆形照明改为单侧和准直照明。结果和讨论：200 μm的L&S图案在10平方毫米的整个曝光区域内成功复制，曝光时间和聚焦裕度分别为±10%和±400 μm。证明了使用抛物面反射镜的简单且低成本的投影光刻在普通尺寸区域中的实用性。结论：使用抛物面反射镜的简单和低成本的投影光刻将适用于立体声光刻或在具有普通场尺寸的任意弯曲物体表面上进行图案化。
: Background : Wearable health monitors are noticed for effectively grasping the conditions of patients and aged peoples. And, various sensors for attaching to body parts such as lists, fingers, and chests are under developments. The sensors and their attachment parts are often made using flexible flat sheets. However, it is often better to make them on curved flexible or bendable shells or solid parts just fitting to the body parts. For this reason, a simple and low-cost method for printing 50-200 µm patterns on arbitrarily curved surfaces was invented using a magic mirror system composed of parabolic mirrors. In the past research, 200-µm L&S patterns on a transparent reticle placed at the lower mirror aperture were projected in the upper mirror aperture. However, successfully patterned areas were limited to the field center. Therefore, it is necessary to extend the patterning area to the whole exposure field. Studies on methods for expanding patterned areas : At first, reasons why resist patterns were not formed in the whole field were examined by tracing the imaging light rays geometrically, and calculating projected image positions. It was found that image positions were varied depending on the illumination direction and the light ray routes, and image positions especially change at the outside parts of the exposure field. Therefore, it was thought effective to illuminate the reticle from one-side by a collimated light. So, the exposure system was renovated. The circular illumination using a ring light was changed to one-sided and collimated illumination. Results and Discussions : 200-µm L&S patternswere successfully replicated in the whole exposure area of 10-mm square with a large exposure time and focus margins of±10% and ±400 µm, respectively. Practical applicability of easy and low-cost projection lithography using parabolic mirrors to patterning in common size fields was proved. Conclusion: Easy and low-cost projection lithography using the parabolic mirrors will be applicable to stereophonic lithography or patterning on arbitrarily curved object surfaces with ordinary field sizes.