In situ measurement of crystallization of oxide thin films during irradiation of pulsed UV laser in chemical solution deposition process
In situ measurement of crystallization of oxide thin films during irradiation of pulsed UV laser in chemical solution deposition process
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化学溶液沉积过程中脉冲紫外激光照射氧化物薄膜结晶的原位测量
DOI：
10.1007/s00340-013-5493-3
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
T. Tsuchiya
中科院分区：
文献类型：
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作者：
K. Shinoda;T. Nakajima;T. Tsuchiya
在准分子激光辅助金属有机沉积（ELAMOD）工艺中，在XeCl激光器的照射下，镧锶锰酸盐薄膜分别在单晶钛酸锶和铝酸镧衬底上外延生长和多晶生长。为了研究生长现象，我们用近红外传感器监测了脉冲紫外激光原位照射样品表面的热辐射。钛酸锶衬底上的锰锶镧薄膜的冷却速度明显慢于铝酸镧衬底上的薄膜。数值模拟研究也观察到类似的行为。这种冷却衰减曲线的差异可能在ELAMOD过程中晶体生长的模式中起重要作用。
The epitaxial and polycrystalline growth of lanthanum strontium manganite films on single crystalline strontium titanate and lanthanum aluminate substrates, respectively, under the irradiation with XeCl lasers in the excimer laser-assisted metal organic deposition (ELAMOD) process have been previously reported. In order to investigate the growth phenomena, we monitored the thermal radiation from the sample surfaces irradiated with a pulsed ultraviolet laser in situ with near-infrared sensors. The cooling of the lanthanum strontium manganite films on strontium titanate substrates was significantly slower than that of films on lanthanum aluminate substrates. A similar behavior was also observed by the numerical simulation study. This difference in the cooling decay curves may play an important role in the mode by which crystal growth occurs in the ELAMOD process.