High-quality LiNbO3 microdisk resonators by undercut etching and surface tension reshaping
High-quality LiNbO3 microdisk resonators by undercut etching and surface tension reshaping
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DOI：
10.1364/oe.20.028119
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发表时间：
2012-12-17
期刊：
影响因子：
3.8
通讯作者：
Niu, Huan
中科院分区：
文献类型：
--
作者：
Wang, Tzyy-Jiann;He, Jheng-Yu;Niu, Huan
我们报道了超光滑铌酸锂微盘谐振器的选择性离子注入，化学蚀刻，和热处理。通过化学腐蚀选择性离子注入形成的掩埋晶格损伤层来产生底切微盘结构。通过热处理，表面张力平滑和重塑微盘表面形貌。利用有限元法对微盘谐振器的谐振特性进行了数值模拟，模拟结果与实验结果吻合较好。直径为20 μ m的微盘谐振腔的FSR为16.43nm，Q值为2.60 × 10（4）。所产生的铌酸锂微盘谐振器可用于新的微盘应用与电光和非线性光学效应。2012美国光学学会Optical Society of America
We report ultra-smooth LiNbO3 microdisk resonators fabricated by selective ion implantation, chemical etching, and thermal treatment. The undercut microdisk structure is produced by chemically etching the buried lattice damage layer formed by selective ion implantation. By thermal treatment, surface tension smoothes and reshapes microdisk surface topography. The resonant characteristics of microdisk resonators are simulated by finite element method and are well consistent with the experimental results. The 20 mu m-diameter microdisk resonator has the FSR of 16.43nm and the Q factor of 2.60 x 10(4). The produced LiNbO3 microdisk resonators can be utilized in new microdisk applications with electro-optic and nonlinear-optic effects. (C)2012 Optical Society of America