Formation mechanism of nanocrystalline high-pressure phases in silicon during nanogrinding
Formation mechanism of nanocrystalline high-pressure phases in silicon during nanogrinding
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DOI：
10.1088/0957-4484/18/46/465705
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发表时间：
2007-11
期刊：
影响因子：
3.5
通讯作者：
Y. Wang;J. Zou;H. Huang;L. Zhou;B. Wang;Y. Wu
中科院分区：
文献类型：
--
作者：
Y. Wang;J. Zou;H. Huang;L. Zhou;B. Wang;Y. Wu
通过透射电子显微镜和拉曼光谱研究了纳米研磨下硅的相变。在重磨硅表面下的非晶层中发现了纳米晶高压相（Si-III/Si-XII）。已发现纳米研磨中的相变顺序与纳米压痕中的相变顺序不同。根据实验结果提出了纳米磨削中纳米晶高压相的形成机制。
The phase transformations of Si under nanogrinding have been studied by transmission electron microscopy and Raman spectroscopy. Nanocrystalline high-pressure phases (Si-III/Si-XII) were found in the amorphous layer of the subsurface of heavily ground Si. The sequence of the phase transformation in nanogrinding has been found to be different to that in nanoindentation. The formation mechanism of the nanocrystalline high-pressure phases in nanogrinding is proposed based on experimental results.