Synthesis of hyperbranched polyacetals via an + b2‐type polyaddition (n = 3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography
Synthesis of hyperbranched polyacetals via an + b2‐type polyaddition (n = 3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography
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通过 + b2 型加聚合成超支化聚缩醛（n = 3、8、18 和 21）：抗极紫外光刻的候选材料
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发表时间：
2015
期刊：
影响因子：
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通讯作者：
T. Kozawa
中科院分区：
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作者：
Hiroto Kudo;Shuhei Matsubara;Hiroki Yamamoto;T. Kozawa
1，1，1-三(4-羟基苯基)乙烷(A3型单体)、杯[4]间苯二酚(CrA[4]；A8型单体)、α-环糊精(α-CD；A18型单体)和β-环糊精(β-CD；A21型单体)与1，4-双(4-乙烯氧基)环己烷(BVOC；B2型单体)的聚合反应(AN B2型)得到了相应的可溶性超支化聚缩醛。通过对聚合物的溶解性、热稳定性、成膜性、紫外光诱导降解反应能力、极紫外光(EUV)曝光仪中的溶解度转换等物理性能的研究表明，聚(THPE-co-BVOC)和聚(CRA[4]-co-BVOC)是下一代光致抗蚀剂的候选材料。©2015威利期刊公司J.Polym。科学，A部分：多晶硅。化学。2015、53、2343-2350
Polyaddition (An + B2) reactions of 1,1,1-tris(4-hydoxyphenyl) ethane (THPE; A3-type monomer), calix[4]resorcinarene (CRA[4]; A8-type monomer), α-cyclodextrin (α-CD; A18-type monomer), and β-cyclodextrin (β-CD; A21-type monomer) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC; B2-type monomer) afforded corresponding soluble hyperbranched polyacetals. The physical properties, including solubility, thermal stability, and film-forming ability, the ultraviolet-induced degradation reactivity, and the solubility-switch in an extreme ultraviolet (EUV) exposure tool indicated that poly(THPE-co-BVOC) and poly(CRA[4]-co-BVOC) are candidate next-generation photo-resists. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 2343–2350