A Front-Side Released Single Crystalline Silicon Piezoresistive Microcantilever Sensor
A Front-Side Released Single Crystalline Silicon Piezoresistive Microcantilever Sensor
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DOI:
10.1109/jsen.2008.2012197
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发表时间:
2009-02
影响因子:
4.3
通讯作者:
Y. Zhou;Zheyao Wang;Qi Zhang;W. Ruan;Litian Liu
中科院分区:
文献类型:
--
作者:
Y. Zhou;Zheyao Wang;Qi Zhang;W. Ruan;Litian Liu
This paper presents the design, fabrication, and characterization of a piezoresistive microcantilever sensor fabricated on silicon-on-insulator (SOI) wafers. The microcantilever consists of two silicon dioxide supporting layers and a single crystalline SOI layer in-between. The piezoresistors are implanted in the surface of the SOI layer to exploit its large piezoresistive coefficients. Laminated beam theory is employed to design the microcantilevers and the piezoresistors. A front-side releasing method is developed to suspend the microcantilevers by isotropically etching the substrate beneath the microcantilevers from the front-side of the wafers using SF6 plasma. The features of SOI wafers and the front-side releasing enable high uniformity and high yield for the fabrication of piezoresistive microcantilever sensors. The sensors are validated using specific binding reaction of antigen and antibody of immunoglobulin G on the sensor surface, and the experimental results show that they are promising for portable and integrated sensing applications.