EML Based on Identical Epitaxial Layer, Side-Wall Grating and HSQ Planarization
EML Based on Identical Epitaxial Layer, Side-Wall Grating and HSQ Planarization
复制标题
基于相同外延层、侧壁光栅和HSQ平坦化的EML
DOI:
10.1109/lpt.2022.3155730
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发表时间:
2022
影响因子:
2.6
通讯作者:
Al-Moathin A
中科院分区:
文献类型:
--
作者:
Al-Moathin A