Improvement of Surface Exfoliation Behavior by Helium-ion Bombardment of a Tungsten Alloy Fabricated by Mechanical Alloying

Improvement of Surface Exfoliation Behavior by Helium-ion Bombardment of a Tungsten Alloy Fabricated by Mechanical Alloying
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DOI:
10.1080/18811248.2007.9711578
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发表时间:
2009-07
影响因子:
1.2
通讯作者:
T. Ogawa;A. Hasegawa;H. Kurishita;S. Nogami
T. Ogawa;A. Hasegawa;H. Kurishita;S. Nogami
中科院分区:
工程技术4区
文献类型:
--
作者:
T. Ogawa;A. Hasegawa;H. Kurishita;S. Nogami

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在室温(RT)、400和550°C下,用3-MeV He离子轰击几种钨合金,研究了它们的鼓泡和剥落现象。研究了采用机械合金化方法制备的具有超细晶粒结构的W-0.3TiC合金、K掺杂W合金和纯W金属,探索了抑制表面损伤的方法。在RT辐照下,在(1-2)× 1022 He/m2的能量密度下,所有试样都发生了表面剥落。在550°C辐照的情况下,在纯W和K掺杂的W中观察到高于2 × 1022 He/m2的辐照,但在W-0.3TiC中观察不到高达2 × 1023 He/m2的辐照量的表面剥离。结果表明,W-0.3TiC具有较好的抗He离子轰击剥离性能,且抗剥离性能与温度有关。通过透射电子显微镜对材料的表面形貌、截面形貌和微观结构进行了表征。氦热脱附光谱进行了确定的机制,使表面获得抵抗损伤,通过氦离子轰击。抗表面剥落性的改善可归因于MA处理材料的超细晶粒结构和晶间增强的He扩散行为。
Blistering and exfoliation of several tungsten alloys, which cause surface damage, were investigated using 3-MeV He-ion bombardment at room temperature (RT), 400, and 550°C. The alloy W-0.3TiC, which was fabricated by the mechanical alloying method and had an ultrafine grain structure, a K-doped W alloy, and pure W metal were examined to explore a way of suppressing the surface damage. In RT irradiation, surface exfoliation occurred at a fluence of (1–2) × 1022 He/m2 in all the tested specimens. In the case of 550°C irradiation, surface exfoliation was observed above 2 × 1022 He/m2 irradiation in pure W and K-doped W, but no surface exfoliation was observed in W-0.3TiC up to a fluence of 2 × 1023 He/m2. The results showed that W-0.3TiC showed a higher resistance to surface exfoliation by He-ion bombardment and the level of resistance was temperature-dependent. The surface morphology, cross-sectional morphology, and microstructure were characterized by transmission electron microscopy. Helium thermal desorption spectrometry was carried out to determine the mechanism whereby the surface attained resistance to the damage through He-ion bombardment. The improvement in the resistance to the surface exfoliation could be attributed to the ultrafine grain structure and the intergranular enhanced He diffusion behavior of the MA-processed material.