Composition and dynamics of high power impulse magnetron discharge at W-Mo-C target in argon atmosphere
Composition and dynamics of high power impulse magnetron discharge at W-Mo-C target in argon atmosphere
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DOI：
10.1016/j.surfcoat.2016.11.006
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发表时间：
2017-10
影响因子：
5.4
通讯作者：
W. Gajewski;A. Ehiasarian;M. Zelechowski;P. Hovsepian
中科院分区：
文献类型：
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作者：
W. Gajewski;A. Ehiasarian;M. Zelechowski;P. Hovsepian
金属掺杂类金刚石（Me-DLC）由于其良好的摩擦学性能而成为一种典型的工业耐磨涂层解决方案。DLC掺杂金属用于降低DLC涂层的内应力，提高其热稳定性、硬度、涂层-基体结合力和耐磨性。此外，应用高功率脉冲磁控溅射（HiPIMS）的Me-DLC沉积允许涂层的附着力和致密化的涂层的改善。为了改善DLC涂层的性能，可以使用从W-Mo-C混合靶中掺杂钨和钼。本文研究了钨钼碳靶在氩气氛下的等离子体化学组成。对于脉冲长度为150 μs的HIPIMS放电，观察到平均功率和电流的线性关系。的光发射光谱实验揭示了时间依赖性的等离子体组成的电流脉冲的发展。首先等离子体由氩中性粒子和离子主导，然后是钼和钨。两种金属物种之间的显着分离观察到的发射的开始和峰值的时间。作为中性气体与金属比率的变化的结果，估计的有效电子温度Te从如从Ar I发射估计的~ 2 eV变化到如由W I发射指示的~ 0.3- 0.6eV。随着HIPIMS频率的变化，也观察到Te的变化：从金属激发估计的Te增加最可能是由于HIPIMS脉冲之间的余辉阶段发生的过程。从氩等离子体在脉冲的第二阶段的脉冲开始富金属等离子体的过渡进行了讨论，与平面探针进行的离子电流测量比较。
Metal-doped diamond-like carbon (Me-DLC) is a typical industrial solution for wear resistant coating due to their tribological properties. DLC doping with metal is used to reduce internal stress of the DLC coating, improve its thermal stability, hardness, coating-substrate adhesion, and wear resistance. Furthermore, application of the High Power Impulse Magnetron Sputtering (HiPIMS) for Me-DLC deposition allows improvement of coating adhesion and densification of the coating. To improve the properties of the DLC coatings doping with tungsten and molybdenum from a mixed W-Mo-C target can be used. This study concerns the plasma chemistry and composition for a W-Mo-C target operated with HIPIMS in argon atmosphere. For a HIPIMS discharge with a fixed pulse length of 150 μs a linear dependence of the average power and current are observed. The optical emission spectroscopy experiments reveal a temporal dependence of the plasma composition as the current pulse develops. First plasma is dominated by argon neutrals and ions followed by molybdenum and tungsten. Significant separation between the two metal species is observed in terms of the times of onset and peak of the emission. As a consequence of the change of the neutral gas to metal ratio the estimated effective electron temperature,Te, changes from ~ 2 eV as estimated from Ar I emission to ~ 0.3–0.6 eV as indicated by W I emission. A change ofTeis also observed with the change of HIPIMS frequency: theTeestimated from metal excitations increases most probably as a result of the processes taking place in the afterglow phase between HIPIMS pulses. The transition from argon plasma at the beginning of the pulse to metal-rich plasma in the second phase of the pulse is discussed in comparison with the ion current measurements performed with a planar probe.