X-Ray Probes for In Situ Studies of Interfaces
X-Ray Probes for In Situ Studies of Interfaces
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DOI：
10.1557/mrs2010.599
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发表时间：
2010-07-01
期刊：
影响因子：
5
通讯作者：
Toney, M. F.
中科院分区：
文献类型：
--
作者：
Fong, D. D.;Lucas, C. A.;Toney, M. F.
表面和埋藏界面在许多环境，催化和摩擦学过程以及包括微电子和光电子学在内的各种应用中起着关键作用。界面的结构和组成与其周围环境密切相关，能够产生材料原位信息的探针对于全面了解界面功能和性质至关重要。来自同步加速器光源的高亮度硬x射线可以很容易地穿透气体或液体环境，甚至固体薄膜覆盖层，并能够以原子尺度分辨率实时监测界面的化学变化和结构。本文综述了各种同步加速器x射线散射技术对界面的原位研究，并提供了它们在电化学过程和薄膜岛生长中的几个应用实例。我们还讨论了分析技术和x射线光学的最新进展，这些进展正在促进表面和埋藏界面的直接成像原位研究。
Surfaces and buried interfaces play critical roles in many environmental, catalytic, and tribological processes and in a wide variety of applications, including microelectronics and optoelectronics. Interfacial structure and composition are closely coupled to their surroundings, and probes that yield information about materials in situ are essential to obtain a thorough understanding of interface functions and properties. The highly brilliant, hard x-rays available from synchrotron light sources can easily penetrate through gas or liquid environments, or even solid thin-film overlayers, and enable real-time monitoring of the evolving chemistry and structure of the interface with atomic-scale resolution. Here we review the in situ study of interfaces by a variety of synchrotron x-ray scattering techniques and provide several examples of their application in electrochemical processes and thin-film island growth. We also discuss recent advances in analytical techniques and x-ray optics that are facilitating the in situ study of surfaces and buried interfaces with direct imaging.