Investigation on the Surface Topography of Amorphous Alloys Implanted with Helium Ions
Investigation on the Surface Topography of Amorphous Alloys Implanted with Helium Ions
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DOI：
10.1142/9789812705198_0046
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发表时间：
2003-06
期刊：
影响因子：
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通讯作者：
M. Hou;Jie Liu;Q. X. Zhang;Zhiguang Wang;Youmei Sun;Zhiyong Zhu;Yunfan Jin;Gang Liu;Changlong Liu
中科院分区：
文献类型：
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作者：
M. Hou;Jie Liu;Q. X. Zhang;Zhiguang Wang;Youmei Sun;Zhiyong Zhu;Yunfan Jin;Gang Liu;Changlong Liu
本文研究了能量为40 keV和60 keV、剂量为（1.0-4.0）× 1018 ions/cm ~ 2的氦离子轰击多种非晶合金引起的表面形变。用扫描电子显微镜观察了辐照后表面形貌的变化。测量水疱直径和剥落的疱盖厚度。结果表明，在不同剂量、能量下，非晶合金表面出现了剥落、起泡、剥落、起泡破裂、第二代起泡和多孔结构等多种形貌特征。讨论了材料种类和离子能量对表面损伤模式和起泡、剥落临界剂量的影响。
The surface deformations induced by helium ion bombardment at the energy of 40keV and 60keV to a dose range of (1.0–4.0)×1018ions/cm2have been investigated for many kinds of amorphous alloys. The changes in surface topography after irradiation were observed by using a scanning electron microscope. The diameter of blister and the thickness of exfoliated blister lids were measured. The results showed that many kinds of surface topography characteristics appeared for different doses, energies and amorphous alloys, such as flaking, blistering, exfoliation, blister rupture, second-generation blistering and porous structure. The dependence of surface damage modes and the critical dose for onset of blistering and flaking on material sort and ion energy was discussed.