Dynamics of graphene growth on a metal surface: a time-dependent photoemission study
Dynamics of graphene growth on a metal surface: a time-dependent photoemission study
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DOI：
10.1088/1367-2630/11/7/073050
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发表时间：
2009-07-29
影响因子：
3.3
通讯作者：
Vyalikh, Denis V.
中科院分区：
文献类型：
--
作者：
Grueneis, Alexander;Kummer, Kurt;Vyalikh, Denis V.
应用时间相关的光电子能谱，我们解开了石墨烯的生长过程中的金属表面的化学气相沉积（CVD）。石墨烯CVD生长与二维薄膜的标准生长过程形成鲜明对比，因为它是自限制的，并且一旦合成了单层石墨烯就停止。最重要的是，发现了一种亚稳态石墨烯的新相，其特征在于永久且同时的构建和解构。高质量和大面积的石墨烯薄片的特征在于角分辨光电发射，证明它们确实是单层的并且覆盖整个I X Icm Ni（111）衬底。这些发现与密集寻找用于控制层数的大石墨烯薄片的可靠合成方法具有高度相关性。
Applying time-dependent photoemission we unravel the graphene growth process on a metallic surface by chemical vapor deposition (CVD). Graphene CVD growth is in stark contrast to the standard growth process of two-dimensional films because it is self-limiting and stops as soon as a monolayer of graphene has been synthesized. Most importantly, a novel phase of metastable graphene was discovered that is characterized by permanent and simultaneous construction and deconstruction. The high quality and large area graphene flakes are characterized by angle-resolved photoemission, proving that they are indeed monolayer and cover the whole 1 x 1 cm Ni(111) substrate. These findings are of high relevance to the intensive search for reliable synthesis methods for large graphene flakes of controlled layer number.