International Symposium on Applications of Ferroelectrics
International Symposium on Applications of Ferroelectrics
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国际铁电体应用研讨会
DOI：
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发表时间：
1993
期刊：
影响因子：
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通讯作者：
G. Haertling
中科院分区：
文献类型：
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作者：
M. Liu;A. Safari;A. Kingon;G. Haertling
摘要：第八届铁电学应用国际研讨会于1992年8月30日至9月2日在南卡罗来纳州格林维尔举行。大约260名科学家和工程师参加了会议，他们提交了近200篇口头和海报论文。三次全体会议介绍了目前正在进入商业开发或具有很大潜力的铁电材料。这些是(1)热释电成像，(2)用于微电机和微型传感器的与硅集成的铁电材料，以及(3)日本对用于DRAM的高介电常数材料的研究活动。应邀发表的论文涉及薄膜的热释电和电光性质、光折变效应、铁电聚合物、压电换能器、铁电材料的加工、铁电材料中的磁区转换、薄膜存储、薄膜真空沉积技术以及化学方法制备的PZT和PLZT薄膜。这些论文继续反映了人们对铁电薄膜的巨大兴趣。令人鼓舞的是，在过去两年里，在处理和理解这些电影方面都取得了很大的进展。然而，同样明显的是，在市场上推出可靠的薄膜器件之前，还有很多工作要做。
Abstract : The eighth International Symposium on the Applications of Ferroelectrics was held in) Greenville, SC, on August 30 to Sept 2, 1992. It was attended by approximately 260 scientists and engineers who presented nearly 200 oral and poster papers. The three plenary presentations covered ferroelectric materials which are currently moving into commercial exploitation or have strong potential to do so. These were (1) pyroelectric imaging, (2) ferroelectric materials integrated with silicon for use as micromotors and microsensors and (3) research activity in Japan on high permittivity materials for DRAMs. Invited papers covered such subjects as pyroelectric and electrooptic properties of thin films, photorefractive effects, ferroelectric polymers, piezoelectric transducers, processing of ferroelectrics, domain switching in ferroelectrics, thin film memories, thin film vacuum deposition techniques and the fabrication of chemically prepared PZT and PLZT thin films. The papers continued to reflect the large interest in ferroelectric thin films. It was encouraging that there have been substantial strides made in both the processing and understanding of the films in the last two years. It was equally clear, however, that much still remains to be done before reliable thin film devices will be available in the marketplace.