Atomically Resolved Imaging of Si(100)2×1, 2×1:H and 1×1:2H Surfaces with Noncontact Atomic Force Microscopy
Atomically Resolved Imaging of Si(100)2×1, 2×1:H and 1×1:2H Surfaces with Noncontact Atomic Force Microscopy
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使用非接触原子力显微镜对 Si(100)2×1、2×1:H 和 1×1:2H 表面进行原子分辨成像
DOI：
10.1143/jjap.41.4857
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发表时间：
2002
影响因子：
1.5
通讯作者：
Y. Sugawara
中科院分区：
文献类型：
--
作者：
S. Morita;Y. Sugawara
本文综述了使用非接触式原子力显微镜 (NC-AFM) 对 Si(100)2×1-clean、Si(100)2×1:H-一氢化物和 Si(100)1×1:2H-二氢化物表面进行原子分辨成像的情况。这些实验结果表明，我们最初的 NC-AFM 具有约 0.01 nm 的横向分辨率，并且可以对 Si(100)2×1-洁净表面的倾斜悬挂键、Si(100)2×1:H-一氢化物表面的单个氢原子以及 Si(100)2×1-洁净表面的缺失二聚体周围的原子应变进行成像。此外，通过减小针尖-样品距离，Si(100)1×1:2H-二氢化物表面的NC-AFM图像图案可以从1×1到2×1改变到1×1。从这些结果可以看出，NC-AFM可以通过自组织机械地诱导表面重建从Si(100)1×1:2H到Si(100)2×1:2H-二氢化物表面的相变，并且还可以通过增加尖端原子与样品表面原子之间的吸引力来将最近的氢原子一一拉起。
Atomically resolved imaging of Si(100)2×1-clean, Si(100)2×1:H-monohydride and Si(100)1×1:2H-dihydride surfaces using a noncontact atomic force microscope (NC-AFM) is reviewed. These experimental results clarify that our original NC-AFM had lateral resolution of about 0.01 nm and could image tilted dangling bonds of the Si(100)2×1-clean surface, individual hydrogen atoms of the Si(100)2×1:H-monohydride surface, and atomic strain around missing dimers of the Si(100)2×1-clean surface. In addition, the NC-AFM image pattern of the Si(100)1×1:2H-dihydride surface can be changed from 1×1 through 2×1 to 1×1 by decreasing the tip-sample distance. From these results, it was concluded that the NC-AFM could mechanically induce phase transition of surface reconstruction from the Si(100)1×1:2H to Si(100)2×1:2H-dihydride surface due to self-organization, and could also pull up the nearest hydrogen atoms one by one by increasing the attractive force between the tip apex atom and sample surface atom.